光罩對準曝光機

首頁/產品一覽/工業品與設備/機械設備/其他機械設備/光罩對準曝光機
光罩對準曝光機

AG Mask Aligner Specification Light Source: NUV/DUV light source: 350W, 500W, 1000W. 2KW, 5 KW

我要詢價
AG Mask Aligner Specification Light Source: NUV/DUV light source: 350W, 500W, 1000W. 2KW, 5 KW, 8KW Exposure area :4”,6”, 8”, 10”, 12”or larger (up to 24”) Wavelength: NUV (included 365nm, 400nm, 436nm.), DUV (220nm, 254nm...etc.) Uniformity: ±1~3% to ± 5% Power supply: Two Channels (Channel A/B) with CI/CP mode  Regular (CP: Constant Power) and/or Intensity Control (CI: Constant Intensity & CP) type Image (Microscope) system: Dual CCD Camera Alignment System : 50X-300X , 90X-600X , 180X~1200x or 250X-1500X Lens Tubes with Video zoom magnification B & W (or Color) Monitors: 9”, 12”, 14”, 17” Ring illumination: (2-separate fiber rings), adjustable fiber optic illuminators, Camera separation range : less ring illuminators 4.3cm~ 20 cm (option with Prism could be smaller to 10cm) Camera Purge hood could be option – prevent particle Single field or Split filed Microscope option is available. Alignment Fixture: Mask vacuum chuck: 4”, 5”, 7”, 9” or Larger (either top or bottom load are all available) Wafer(substrate) vacuum chuck: round or Square 2”, 4”, 6” 8”, Larger all with multi substrate and pre-alignment pin Mask , Wafer Auto leveling (planarize ) function Adjustable Vacuum pressure With Proximity, Hard , Soft Contact mode X,Y axis adjustment range: 12mm with resolution 1um (Option 0.1um) Θ axis adjustment range: ±3° in Theta with 0.0001° increment Z axis adjustment range: 6mm, resolution 1um Manual or Auto (option) Load unload wafer (substrate) N2 purge in between the wafer and mask and wafer. UV expose and the Nano imprint aspect ratio can be 10:1 with 300 um thickness PR (option item). Operation system: PLC or computer with Touch panel control interface, plus the operator control switch box. Pneumatics & electronics valve control system Timer: 0.1-999 sec / Emergency StopMask Vacuum : 0~ 25” Hg Wafer Vacuum: 0~ 25” Hg Auto leveling in between Mask vs. substrate Auto Z axis: auto gape adjustment—only input the gape value in between mask and wafer—i.e. 100um, then optical encoder and step motor system will automatically do the leveling and also gape tuning. System power (light source, illuminator, power supply ,) integrate at same panel Control the Nano Imprint pressure by motor and also Air Cylinder (option item). Vibration proof table (option): 1)Integrate 4 vibration pads with Al. or SUS frame to support Aligner 2) Option with the granite plate for Vibration isolation is available. 3) Integrate TMC or New Port vibration proof table with Aligner - Could integrate auto light shutter Performance: Production speed : 2~4 pcs/minutes With Vacuum hard contact: the printing resolution could be from 1.0 (NUV) and 0.5um (DUV) With proximity mode: the printing resolution is 2~5um] Other then Standard system, We could build up Customized system for you!!
#光罩對準曝光機#導體曝光機#平行曝光機#曝光機#曝光機原理#曝光機平行光#車廂#玻璃水平儀#進口出口
https://www.seoweb66.com/web/QA?postID=957229冷冻液超低温冷却机

低温冷冻机的特点:低温型冷冻机(-5- -40度)特点,制冷量大,采用世界名牌进口压缩机,低温性能卓

企業名片

//s.web66.com.tw/_file/43729/piclist/logo1.jpg
查看更多

歷史詢價

  • 許*華
    動物實驗 豬隻如何飼養
    10-24 17:28
  • 朱*姐
    空壓機壓縮空氣檢測
    10-24 17:20
  • J*n*****
    27英吋充氣地球 詢價
    10-24 17:17
  • 蘇*芳
    請問報價不鏽鋼平衡式浮球
    10-24 16:57
  • 鄭*權
    pe+pp瓶罐粉碎料
    10-24 16:50
  • 尹*
    AIM-5R-1700-A04
    10-24 16:45
  • 陳*延
    詢價 出流管制計畫書
    10-24 16:40
  • 吳*姐
    <頎邦科技詢價>
    10-24 16:27
  • 鄭*權
    pp吹瓶級的粉碎料,pe+pp瓶罐的粉碎料
    10-24 16:22
  • 蘇*芳
    問1-2"
    10-24 16:05
  • 李*姐
    印雜誌 有此需求 請報價
    10-24 15:59
  • 孫*聰
    貨櫃屋 有此需求 請協助報價
    10-24 15:52
  • 鐘*綺
    廣告招牌訂製詢價單
    10-24 15:51
  • 許*雲
    關於黑鐵扁管的詢價
    10-24 15:50
  • 李*榛
    有蛇年燈籠 有此需求 請報價
    10-24 15:48
  • 林*秋
    詢價:氧化鐿 Yb2O3,純度:3N-4N - 粒徑:<1um
    10-24 15:45
  • 鍾*璇
    可否客製尺寸詢價單
    10-24 15:35
  • 簡*瑀
    請問你們再做2k月曆裝訂加工嗎
    10-24 15:27
  • 姜*茹
    Polo衫吸濕排汗風衣印花膠印服務詢價單
    10-24 15:24
  • 曾*生
    喀土網 怎麼賣?
    10-24 15:12
免費註冊
立即成為台灣黃頁 詢價供貨商,多站同步網路詢價單不漏接!
再送你獨立詢價官網!
免費註冊