Plasma Etcher System

Description: AST Chaser Plasma Etcher System provides the complete product line covering the production scale from volume production, pilot production to RD platform. Aurora Sputter System has served Industry of worldwide customers from LED, LD, Solar Cell, Power Semiconductor, Compound Semiconductor, MEMS, Advanced Packaging, EMI Device applications. 1) LED / III-V Etching (GaN Mesa, GaAs Via, InP Trench) 2) Pattern Sapphire Substrate (PSS) Etching 3) Photonic Crystal (PhC) Etching 4) Silicon Etching (Deep Si Etching, Bulk Si Etching) 5) Si-based material Etching 6) Polymer Etching 7) Metal Etching 8) Quartz and Single Crystal Material Etching Features: Aurora series has system configuration of RIE, ICP, TCP, HDP, High Density Plasma source and Cryogenic Backside Helium Cooling System for substrate temperature control, suitable for different customer application. Specification: Standard Single Chamber Batch System and Multi-Chamber Cluster System Available. Safety Approval: TUV Country of Origin: Taiwan Main Export Markets: Worldwide Please contact AST for your application.